DRC
- LVS
Mask Design Verification
Verification products include both DRC and LVS. The LVS product
includes a compare module to compare the extracted netlist to the
reference netlist. Both products are integrated within the slam
environment. Both are invoked from within slam. The results of the
DRC product are stored in the database and may be reviewed with
VioVue which is part of the slam layout viewer. The LVS product
generates a text error report in addition to the graphical error
report. The LVS product can also generate a netlist from the layout
in spice format.
Note the 3.4.1 release offers a completely new any angle more efficient DRC. The old
code can still be called. Later releases will be providing the same new architecture
for LVS extraction. The new 3.4.1 code offers some command options not
available in prior releases, but the new code is backwards compatible and can run
prior decks unchanged.
Features:
* Graphical display of errors. In this example the red bars on the
left indicate a spacing violation. The horizontal lines on right
indicate a width violation. snapshot
* Notch fill.
* Width, one and two layer spacing checks, enclosure checks and
boolean operations.
* End of line checks for asymetrical via enclosure rules.
* Option to spacing check for field poly to active area check.
* Option to enclosure check to verify poly extension of active and
active extension over poly.
* polygon selection based on area for minimum metal island checks
and metal width checks based on metal area (fat metal rules).
* Area mode, check a specific rectangle of the layout.
useful to verify small edits quickly in large designs.
* Changed area mode, check the areas that have been modified since
the last check.
* Metal check deck can be auto-generated from configuration file.
useful to quickly generate check decks for P&R edit checking.
* MOSIS DRC deck included.
* LVS includes a interconnect capacitance extractor mode.
* Generic 4, 5 and 6 layer metal process LVS decks included.